The polarization difference and band offset between Al(Ga)N and GaN induce two-dimensional (2D) free carriers in Al(Ga)N/GaN heterojunctions without any chemical doping. A high-density 2D electron gas (2DEG), analogous to the recently discovered 2D hole gas in a metal-polar structure, is predicted in a N-polar pseudomorphic GaN/Al(Ga)N heterostructure on unstrained AlN. We report the observation of such 2DEGs in N-polar undoped pseudomorphic GaN/AlGaN heterostructures on single-crystal AlN substrates by molecular beam epitaxy. With a high electron density of ∼4.3 ×1013/cm2 that maintains down to cryogenic temperatures and a room temperature electron mobility of ∼450 cm2/V s, a sheet resistance as low as ∼320 Ω/◻ is achieved in a structure with an 8 nm GaN layer. These results indicate significant potential of AlN platform for future high-power RF electronics based on N-polar III-nitride high electron mobility transistors.
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Zhang, Zexuan ; Encomendero, Jimy ; Chaudhuri, Reet ; Cho, Yongjin ; Protasenko, Vladimir ; Nomoto, Kazuki ; Lee, Kevin ; Toita, Masato ; Xing, Huili Grace ; Jena, Debdeep ( , Applied Physics Letters)
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Cho, YongJin ; Chang, Celesta S. ; Lee, Kevin ; Gong, Mingli ; Nomoto, Kazuki ; Toita, Masato ; Schowalter, Leo J. ; Muller, David A. ; Jena, Debdeep ; Xing, Huili Grace ( , Applied Physics Letters)null (Ed.)